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Khamoshiyan Movie 2015 OnlineWatch Khamoshiyan HdVideoKhamoshiyan Download Full Movie Hd 1080 Pc FreeMovies TVFree Download Movies Khamoshiyan, Watch free Streaming Hd Video Khamoshiyan 2015 in best look.Download Full Movies with hdfriday. On this page you can download Khamoshiyan (2015), Watch Online Khamoshiyan (2015) for free. All of them are hosted on Putlocker. You will find many other movies produced by people like you, with your right to share, watch, copy, and enjoy them here1. Field of the Invention This invention relates to a photosensitive composition used in the production of a chemically amplified positive resist containing an acid generator as a necessary component, particularly to a photosensitive composition suitable for use in lithography using a far ultraviolet ray (i-line) or vacuum ultraviolet ray (line) as a light source. 2. Discussion of the Related Art In the production of VLSI or ULSI, fine processing for nano-order size has been demanded for more than a half of the year. A mass production process using a photolithography process is the typical one of fine processing techniques. In the mass production process, a negative photosensitive composition is generally used. Accordingly, it has been demanded to provide a positive photosensitive composition which is a direct positive type which does not require an etching process and in which the resolution is high. Recently, a chemical amplification positive resist using as a positive photosensitive composition an alkaline-soluble material which generates an acid when irradiated with active radiation is disclosed, and has been proposed (e.g., J. Photopolym. Sci. Technol., Vol. 9, No. 3 (1996), pp. 397-401, etc.). This positive resist has a high resolution since the pattern formed is obtained by decomposing an alkali-soluble resin by the catalytic action of an acid generated by irradiation, and forming a pattern. In such a positive resist, an alkali-soluble resin is used as the base resin. A polyhydroxy styrene having a phenolic hydroxyl group substituted by a protecting group is known as the typical base resin. In recent years, a polyhydroxystyrene having a tert-butyloxycarbonyloxy group as the substituent is studied as a base resin which gives a high resolution (J. Photopolym. Sci. Techn




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